Of a nanoscale Kelvin probe for detecting wear precursors

被引:68
作者
DeVecchio, D [1 ]
Bhushan, B [1 ]
机构
[1] Ohio State Univ, Comp Microtribol & Contaminat Lab, Columbus, OH 43210 USA
关键词
D O I
10.1063/1.1149148
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A version of a Kelvin probe that has been developed for an atomic force microscope (AFM), here referred to as a nano-Kelvin probe, is used to create maps of surface potential for study of samples that have been abraded by an AFM tip. The focus is on the wear at very low loads that involve the absence of wear debris and/or wear scars. Wear scars at higher loads, where significant damage to surface has occurred, have also been studied for reference purposes. Samples studied include single crystal aluminum, alumina, gold, and silicon. It is shown that even in cases where there is little or no damage to the surface, as observed by topography scans of an AFM, there is often a large change in the potential at the surface of the sample. The change in surface potential is believed to be the result of chemical and structural changes in the first few nanometers of the sample. We have shown that, even in the case of "zero wear" (that is, no visible deformation of the surface), there can be a significant change in the surface potential inside the wear scar. This allows for the study of the onset of wear in the ultralow wear regime that is not possible with other techniques. The study of wear precursors is particularly important for the hard disk drive industry, the microelectromechanical systems industry, and other industries where the presence of any microscopic wear or debris can represent total failure. (C) 1998 American Institute of Physics. [S0034-6748(98)04310-X].
引用
收藏
页码:3618 / 3624
页数:7
相关论文
共 15 条
[1]   MICRO KELVIN PROBE FOR LOCAL WORK-FUNCTION MEASUREMENTS [J].
BAUMGARTNER, H ;
LIESS, HD .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1988, 59 (05) :802-805
[2]  
BHUSAN B, 1999, HDB MICRONANOTRIBOLO
[3]   7X7 RECONSTRUCTION ON SI(111) RESOLVED IN REAL SPACE [J].
BINNIG, G ;
ROHRER, H ;
GERBER, C ;
WEIBEL, E .
PHYSICAL REVIEW LETTERS, 1983, 50 (02) :120-123
[4]   THE KELVIN PROBE METHOD FOR WORK FUNCTION TOPOGRAPHIES - TECHNICAL PROBLEMS AND SOLUTIONS [J].
BONNET, J ;
SOONCKINDT, L ;
LASSABATERE, L .
VACUUM, 1984, 34 (07) :693-698
[5]  
FORTNEY LR, 1987, PRINCIPLES ELECT
[6]  
HALLIDAY D, 1981, FUNDAMENTALS PHYSICS
[7]  
Jones D.A., 1992, PRINCIPLES PREVENTIO
[8]  
KELVIN, 1898, PHILOS MAG, V46, P80
[9]   HIGH-RESOLUTION CAPACITANCE MEASUREMENT AND POTENTIOMETRY BY FORCE MICROSCOPY [J].
MARTIN, Y ;
ABRAHAM, DW ;
WICKRAMASINGHE, HK .
APPLIED PHYSICS LETTERS, 1988, 52 (13) :1103-1105
[10]   HYSTERESIS AND DISCONTINUITY IN THE INDENTATION LOAD-DISPLACEMENT BEHAVIOR OF SILICON [J].
PHARR, GM ;
OLIVER, WC ;
CLARKE, DR .
SCRIPTA METALLURGICA, 1989, 23 (11) :1949-1952