Laser-assisted selective deposition of nickel patterns on porous silicon substrates

被引：25

作者：

Kordás, K

Remes, J

Leppävuori, S

Nánai, L

机构：

[1] Univ Oulu, Microelect & Mat Phys Labs, FIN-90570 Oulu, Finland

[2] Univ Oulu, EMPART Res Grp Infotech Oulu, FIN-90570 Oulu, Finland

[3] Univ Szeged, Dept Phys, JGYTFK, H-6720 Szeged, Hungary

来源：

APPLIED SURFACE SCIENCE | 2001年 / 178卷 / 1-4期

关键词：

porous materials preparation; laser radiation; surface irradiation effects; laser applications; metallization; integrated circuits; metals processing; metal thin films; electrical conductivity;

D O I：

10.1016/S0169-4332(01)00247-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this paper, a simple method is presented for the fabrication of nickel (Ni) patterns on porous silicon (PS) substrates using a focused and scanned Ar+-laser beam. A commercially available electroless plating bath was operated as a precursor during the laser direct writing process. As a result, thin (t = 40-250 nm), narrow (w = 2-3 mum), uniform and conductive Ni deposits were formed on the surface of the PS. The deposits were characterized by profilometry, FESEM (equipped with EDX), FIB and resistance measurements. (C) 2001 Elsevier Science B,V. All rights reserved.

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页码：93 / 97

页数：5

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