Synthesis of GaN quantum dots by ion implantation in dielectrics

被引:48
作者
Borsella, E
Garcia, MA
Mattei, G
Maurizio, C
Mazzoldi, P
Cattaruzza, E
Gonella, F
Battaglin, G
Quaranta, A
D'Acapito, F
机构
[1] Univ Padua, Dipartimento Fis, INFM, I-35131 Padua, Italy
[2] Univ Venice, Dipartimento Chim Fis, INFM, I-30123 Venice, Italy
[3] Univ Trent, Dipartimento Ingn Mat, INFM, I-38050 Trent, Italy
[4] European Synchrotron Radiat Facil, INFM OGG, F-38043 Grenoble, France
关键词
D O I
10.1063/1.1408591
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaN nanocrystals (in the wurtzite phase) were synthesized by sequential implantation of Ga and N ions into either crystalline (quartz, sapphire) or amorphous (silica) dielectrics, followed by annealing of the samples in flowing NH3 gas at 900 degreesC. GaN was formed by reaction of implanted Ga with NH3 combustion products and/or via conversion of Ga oxide/oxynitrides. A blueshift of the near-band-edge photoluminescence (quantum-confinement effect) was observed for GaN nanocrystals with size less than or equal to2-3 nm, present in all the substrates. (C) 2001 American Institute of Physics.
引用
收藏
页码:4467 / 4473
页数:7
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