Fabrication of solid-state nanopores with single-nanometre precision

被引:1111
作者
Storm, AJ
Chen, JH
Ling, XS
Zandbergen, HW
Dekker, C [1 ]
机构
[1] Delft Univ Technol, Dept Nanosci, NL-2628 CJ Delft, Netherlands
[2] Netherlands Inst Met Res, NL-2628 AL Delft, Netherlands
[3] Brown Univ, Dept Phys, Providence, RI 02912 USA
关键词
D O I
10.1038/nmat941
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Single nanometre-sized pores (nanopores) embedded in an insulating membrane are an exciting new class of nanosensors for rapid electrical detection and characterization of biomolecules. Notable examples include α-hemolysin protein nanopores in lipid membranes1,2 and solid-state nanopores3 in Si3N4. Here we report a new technique for fabricating silicon oxide nanopores with single-nanometre precision and direct visual feedback, using state-of-the-art silicon technology and transmission electron microscopy. First, a pore of 20 nm is opened in a silicon membrane by using electron-beam lithography and anisotropic etching. After thermal oxidation, the pore can be reduced to a single-nanometre when it is exposed to a high-energy electron beam. This fluidizes the silicon oxide leading to a shrinking of the small hole due to surface tension. When the electron beam is switched off, the material quenches and retains its shape. This technique dramatically increases the level of control in the fabrication of a wide range of nanodevices.
引用
收藏
页码:537 / 540
页数:4
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