Characterization of large area filtered are deposition technology: part I - plasma processing parameters

被引：39

作者：

Gorokhovsy, VI ^{[1
]}

Bhattacharya, R

Bhat, DG

机构：

[1] Arcomac Plasma Proc Lab, Toronto, ON, Canada

[2] UES Inc, Dayton, OH USA

[3] Stellram Inc, La Vergne, TN USA

来源：

SURFACE & COATINGS TECHNOLOGY | 2001年 / 140卷 / 02期

关键词：

vacuum arc; filtered arc; uniformity; ion current; multilayer; plasma immersion;

D O I：

10.1016/S0257-8972(01)01022-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The transmission of metal-gas plasma flow generated by large area, rectangular dual-filtered-are source is investigated. The characteristic parameters of plasma flow such as ion current yield and inter-electrode voltage drop vs, gas pressure, are established for the deposition of TiN coatings. The uniformity and productivity of coating deposition on complex parts in a 3D operational volume is determined. It is found that ion current yield increases from 6 to 10 A with increasing argon pressure in the range of 2-7 x 10(-2) Pa. It results in a deposition rate on the order 1-2 mum/h in a double rotation mode. It is shown that a thickness uniformity of +/- 10% or better can be achieved in a programmable, vertical scanning mode. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：82 / 92

页数：11

共 17 条

[1] A rectilinear plasma filtering system for vacuum-arc deposition of diamond-like carbon coatings [J].