Structure and thermal stability of ceria films supported on YSZ(100) and α-Al2O3(0001)

被引：22

作者：

Costa-Nunes, O

Ferrizz, RM

Gorte, RJ

Vohs, JM

机构：

[1] Univ Penn, Dept Chem & Biomol Engn, Philadelphia, PA 19104 USA

[2] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

SURFACE SCIENCE | 2005年 / 592卷 / 1-3期

关键词：

ceria; zirconia; Al2O3; X-ray photoelectron spectroscopy; atomic force microscopy;

D O I：

10.1016/j.susc.2005.06.029

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The morphology and reducibility of vapor-deposited ceria films supported on yttria-stabilized zirconia (100) (YSZ(1 0 0)) and alpha-Al2O3(0 0 0 1) single crystals were studied using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFNI). The results of this study show that the gas environment has a significant effect on the structure of the ceria films on both substrates. CeO2 films on alpha-Al2O3(0 0 0 1) were found to be stable in a reducing environment at temperatures up to 1000 K, but underwent agglomeration and reaction with the support to form CeAlO3 upon annealing at 1273 K in air. Heating CeO2/YSZ(1 0 0) in air at 1273 K caused the ceria thin film to agglomerate into bar-shaped features which were re-dispersed by subsequent annealing in vacuum. Interactions at the CeO2 YSZ interface were also found to dramatically enhance the reducibility of ceria films supported on YSZ(1 0 0). (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：8 / 17

页数：10

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