Partial reduction of Si(IV) in SiO2 thin film by deposited metal particles:: an XPS study

被引:17
作者
Komiyama, M [1 ]
Shimaguchi, T [1 ]
机构
[1] Okazaki Natl Res Inst, Inst Mol Sci, Okazaki, Aichi 4448585, Japan
关键词
x-ray photoelectron spectroscopy; surface electronic phenomena; platinum; palladium; silver; gold; silicon oxide; metal-insulator interface;
D O I
10.1002/sia.1034
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Metal-support interactions in systems of dispersed metals supported on thin-film silica surfaces were examined by x-ray photoelectron spectroscopy. Four metal-silica systems-Pt-, Pd-, Ag- and Au-SiO2-all indicated the formation of partially reduced Si(IV) species by the metal deposition. The extent of the reduction varied little with the kind or amount of deposited metal species. On the other hand, the amount of this newly formed Si(IV-delta) indicated a strong metal species dependence. Copyright (C) 2001 John Wiley & Sons, Ltd.
引用
收藏
页码:189 / 192
页数:4
相关论文
共 23 条
[21]   XPS INVESTIGATION OF STRONG METAL SUPPORT INTERACTIONS ON GROUP IIIA-VA OXIDES [J].
SEXTON, BA ;
HUGHES, AE ;
FOGER, K .
JOURNAL OF CATALYSIS, 1982, 77 (01) :85-93
[22]   FORMATION OF CHARGE-REDUCED SI4+ SPECIES IN SIO2 THIN-FILM BY SUPPORTED METAL PARTICLES - POSSIBILITY OF ELECTRONIC METAL-SUPPORT INTERACTION IN SILICA-SUPPORTED METAL-CATALYSTS [J].
SHIMAGUCHI, T ;
KOMIYAMA, M .
NIPPON KAGAKU KAISHI, 1995, (06) :490-491
[23]   PERIODIC CHARGE-DENSITY MODULATIONS ON GRAPHITE NEAR PLATINUM PARTICLES [J].
XHIE, J ;
SATTLER, K ;
MULLER, U ;
VENKATESWARAN, N ;
RAINA, G .
PHYSICAL REVIEW B, 1991, 43 (11) :8917-8923