共 30 条
[6]
Kang YJ, 2007, MATER RES SOC SYMP P, V991, P275
[9]
Single Wafer Cleaning and Drying: Particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" Dry
[J].
ISSM 2000: NINTH INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, PROCEEDINGS,
2000,
:157-160