High mobility in n-type GaN substrates

被引:20
作者
Saxler, A [1 ]
Look, DC
Elhamri, S
Sizelove, J
Mitchel, WC
Sung, CM
Park, SS
Lee, KY
机构
[1] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[2] Univ Massachusetts, Ctr Adv Mat, Lowell, MA 01854 USA
[3] Samsung Adv Inst Technol, Suwon, South Korea
[4] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[5] Univ Dayton, Dept Phys, Dayton, OH 45469 USA
关键词
D O I
10.1063/1.1348304
中图分类号
O59 [应用物理学];
学科分类号
摘要
High peak electron mobilities were observed in freestanding c-plane GaN layers. Two well-defined electrical layers, a low mobility degenerate interface layer, and a high mobility nondegenerate bulk layer, were present in these samples. The carrier concentrations and mobilities for the layers were extracted using two methods: (1) magnetic field dependent Hall effect analysis; and (2) a simple two layer Hall model with the assumption that one of the layers is degenerate. The electron Hall mobility of the bulk layer is found to peak at nearly 8000 cm(2)/V s at low temperature using the magnetic field dependent Hall effect analysis. (C) 2001 American Institute of Physics.
引用
收藏
页码:1873 / 1875
页数:3
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