Using an afterglow plasma to modify frequency (RF) polystyrene surfaces in pulsed radio argon discharges

被引:22
作者
Dhayal, M
Forder, D
Parry, KL
Short, RD
Bradley, JW
机构
[1] Univ Manchester, Inst Sci & Technol, Dept Phys, Manchester M60 1QD, Lancs, England
[2] Univ Sheffield, Dept Mat Engn, Lab Surface & Interface Anal, Sheffield S1 3JD, S Yorkshire, England
关键词
pulsed radio frequency plasma; polymer surface modification; tailored plasmas;
D O I
10.1016/S0257-8972(03)00562-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A systematic study has been made to characterise a pulsed RF discharge used for the plasma treatment of polymers. Using a time-resolved Langmuir probe and a time-resolved retarding field energy analyser (RFA) the electron temperature and density, plasma potential, ion energy distribution function (IEDF) and electron energy distribution function (EEDF) has been measured. The source was pulsed for a range of frequencies from 100 Hz to 1 KHz at various duty cycles from 20 to 80%. A base pressure less than 10(-5) Torr was achieved to decrease the level of impurities in the chamber. The electron temperature (T-e) decreases from 5 eV to less than 0.5 eV in afterglow. The cooling rate of T-e depends on the pressure, power and duty cycle. By pulsing a biased grid synchronously with the pulsed RF, ions are selected from different time of the plasma and allowed to impinge on a polymer surface. Modified oxygen to carbon (O/C) ratio in the upper layer of polystyrene has been measured by X-ray photon emission spectroscopy (XPS) for different energy and flux of plasma ions. These results show that the treatment is either insensitive to ion energy or dominated by the UV in the discharge. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:872 / 876
页数:5
相关论文
共 13 条
[1]   Investigating radio frequency plasmas used for the modification of polymer surfaces [J].
Barton, D ;
Bradley, JW ;
Steele, DA ;
Short, RD .
JOURNAL OF PHYSICAL CHEMISTRY B, 1999, 103 (21) :4423-4430
[2]   Measurement of the plasma potential in a magnetron discharge and the prediction of the electron drift speeds [J].
Bradley, JW ;
Thompson, S ;
Gonzalvo, YA .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (03) :490-501
[3]   Modified triode plasma configuration allowing precise control of ion-energy for preparing high mobility a-Si:H [J].
Ganguly, G ;
Ikeda, T ;
Sakata, I ;
Matsuda, A ;
Kato, K ;
Iizuka, S ;
Sato, N .
AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 :347-352
[4]   Lecture notes on radio-frequency discharges, dc potentials, ion and electron energy distributions [J].
Goedheer, WJ .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04) :507-516
[5]  
HUTCHINSON IH, 1987, PRINCIPLES PLASMA DI
[6]  
KUWAMURA E, 1999, PLASMA SOURCES SCI T, V8, P45
[7]   ANALYTICAL SOLUTION FOR CAPACITIVE RF SHEATH [J].
LIEBERMAN, MA .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1988, 16 (06) :638-644
[8]   Calculation of ion energy distributions from radio frequency plasmas using a simplified kinetic approach [J].
Misakian, M ;
Wang, YC .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (08) :3646-3653
[9]  
Swift J. D., 1970, ELECT PROBES PLASMA
[10]   Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas [J].
Wang, SB ;
Wendt, AE .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (05) :1358-1365