Coulomb blockade effects at room temperature in thin-film nanoconstrictions fabricated by a novel technique

被引:22
作者
Kubatkin, SE [1 ]
Danilov, AV [1 ]
Bogdanov, AL [1 ]
Olin, H [1 ]
Claeson, T [1 ]
机构
[1] Univ Lund, Dept Solid State Phys, SE-22100 Lund, Sweden
关键词
D O I
10.1063/1.122838
中图分类号
O59 [应用物理学];
学科分类号
摘要
A technique was developed to fabricate and probe nanosize tunneling structures in thin metallic films. Using oblique evaporation through conventional undercut electron-beam lithographic masks, as the sample resistance was measured in situ, we defined constrictions with widths and lengths of about 10 nm in thin granular palladium films. The tunneling conductivity through a network of metallic grains was studied. Single electron tunneling transistor effects were registered. An electrostatic gate voltage at room temperature could clearly modulate Coulomb blockade offsets of the order of 0.1 V in the current-voltage curves. (C) 1998 American Institute of Physics. [S0003-6951(98)02250-5].
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收藏
页码:3604 / 3606
页数:3
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