MgO(100) surface relaxation by symmetrized automated tensor low energy electron diffraction analysis

被引：15

作者：

Ferry, D

Suzanne, J ^{[1
]}

Panella, V

Barbieri, A

Van Hove, MA

Biberian, JP

机构：

[1] Fac Sci Luminy, Dept Phys, CNRS, CRMC2, F-13288 Marseille 9, France

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期

关键词：

D O I：

10.1116/1.581337

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We present a low energy electron diffraction study of the surface relaxation of MgO(100) at T = 80 K down to the second atomic layer using in situ cleaved MgO crystals. We find that the main perturbation from the bulk structure is a topmost surface layer rumpling of 3.3 +/- 1.5% and a very small second layer rumpling of 0.2 +/- 2%. In both cases the oxygen atom is displaced outward. The first interlayer spacing is slightly reduced by 0.2 +/- 0.7% whereas there is no change in the second interlayer spacing. (C) 1998 American Vacuum Society. [S0734-2101(98)02104-6].

引用

页码：2261 / 2266

页数：6

共 27 条

[21] RELIABILITY FACTORS FOR LEED CALCULATIONS [J].