In-plane anomalies of the exchange bias field in Ni80Fe20/Fe50 Mn50 bilayers on Cu(110)

被引:19
作者
Riedling, S
Bauer, M
Mathieu, C
Hillebrands, B
Jungblut, R
Kohlhepp, J
Reinders, A
机构
[1] Univ Kaiserslautern, Fac Phys, D-67663 Kaiserslautern, Germany
[2] Univ Kaiserslautern, Schwerpunkt Mat Wissensch, D-67663 Kaiserslautern, Germany
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
D O I
10.1063/1.370174
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the exchange bias effect as a function of the in-plane direction of the applied field in twofold symmetric, epitaxial Ni80Fe20/Fe50Mn50 bilayers grown on Cu(110) single-crystal substrates. An enhancement of the exchange bias field, H-eb, up to a factor of 2 is observed if the external field is nearly, but not fully aligned perpendicular to the symmetry direction of the exchange bias field. From the measurement of the exchange bias field as a function of the in-plane angle of the applied field, the unidirectional, uniaxial and fourfold anisotropy contributions are determined with high precision. The symmetry direction of the unidirectional anisotropy switches with increasing NiFe thickness from [1 (1) over bar 0] to [001]. (C) 1999 American Institute of Physics. [S0021-8979(99)01907-6].
引用
收藏
页码:6648 / 6651
页数:4
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