Raman scattering characterization of CVD graphite films

被引：77

作者：

Obraztsov, Alexander N. ^{[1
,4
]}

Tyurnina, Anastasiya V. ^{[1
,3
]}

Obraztsova, Ekaterina A. ^{[1
]}

Zolotukhin, Alexey A. ^{[1
,3
,4
]}

Liu, Binghai ^{[2
]}

Chin, Kok-Chung ^{[2
]}

Wee, Andrew T. S. ^{[2
]}

机构：

[1] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119991, Russia

[2] Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore

[3] Technol Inst Superhard & Novel Carbon Mat, Troitsk 142190, Russia

[4] Univ Joensuu, Dept Phys & Math, FIN-80101 Joensuu, Finland

来源：

CARBON | 2008年 / 46卷 / 06期

关键词：

D O I：

10.1016/j.carbon.2008.03.002

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Raman spectroscopic study has been performed for thin graphite films grown on nickel substrates by chemical vapor deposition from a mixture of hydrogen and methane activated by a direct current discharge. Depending on the growth conditions, the CVD films are composed of graphene layers parallel to the substrate surface or of plate-like crystallites with the predominant orientation of their graphene layers perpendicular to the substrate surface. A comparison of the Raman spectra for the CVD films and for the highly oriented pyrolytic graphite has been performed. The mechanisms governing the Raman scattering process in the films are discussed. An important role of a double resonance mechanism in the Raman spectra of these graphite-based materials has been revealed. The Raman band positions and intensities and their dependence on excitation wavelength confirm a high degree of the structural order in the CVD graphite films. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：963 / 968

页数：6

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