Microstructures, electrical and optical properties of non-stoichiometric p-type nickel oxide films by radio frequency reactive sputtering

The NiO films were sputtered by radio frequency (rf) reactive magnetron sputtering with different O-2 partial pressures. The electric resistivity (p) of NiO films continuously decreases from 0.45 to 0.01 Omega-cm as the O-2 partial pressure is increased from 10 to 100%. On the other hand, the transmittance also decreases continuously from 96.33% to 32.93% as the O-2 partial pressure increases from 0 to 100%. The lattice parameter of NiO films increases with increasing the O-2 partial pressures, but the crystallinity of the films decreases significantly. (C) 2010 Elsevier B.V. All rights reserved.