Characterization of silica xerogel films by variable-angle spectroscopic ellipsometry and infrared spectroscopy

被引:21
作者
Himcinschi, C [1 ]
Friedrich, M
Murray, C
Streiter, I
Schulz, SE
Gessner, T
Zahn, DRT
机构
[1] Tech Univ Chemnitz, Inst Phys, D-09107 Chemnitz, Germany
[2] Tech Univ Chemnitz, Zentrum Mikrotechnol, D-09107 Chemnitz, Germany
关键词
D O I
10.1088/0268-1242/16/9/312
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silica xerogel films with low dielectric constants were prepared using a sol-gel spin coating method. The as-prepared films were further treated by hexamethyldisilazane to achieve the hydrophobization of the pore surfaces, by replacing hydrophilic silanol groups with hydrophobic trimethylsilyl (TMS) groups. The thickness and optical constants of the films were derived from variable-angle spectroscopic ellipsometry measurements. The determined refractive index decreases from 1.271 +/- 0.008 to 1.188 +/- 0.003 (values at 632.8 nm) while the porosity increases from 40.4 to 58.6% with the process parameters used. The Maxwell-Garnet approximation was used to relate the ellipsometric data to porosity. The IR absorption bands of CH species in TMS groups reveal that the surface area of the pores is larger in the samples with lower porosity.
引用
收藏
页码:806 / 811
页数:6
相关论文
共 15 条
[1]   Novel porous films having low dielectric constants synthesized by liquid phase silylation of spin-on glass sol for intermetal dielectrics [J].
Aoi, N .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (3B) :1355-1359
[2]  
BAUER G, 1996, OPTICAL CHARACTERISA
[3]   LOW DIELECTRIC-CONSTANT INSULATORS FOR ELECTRONICS APPLICATIONS [J].
CHO, CC ;
SMITH, DM ;
ANDERSON, J .
MATERIALS CHEMISTRY AND PHYSICS, 1995, 42 (02) :91-95
[4]  
Edwards D.F., 1985, Handbook of optical constants of solids
[5]   Nanoporous silica as an ultralow-k dielectric [J].
Jin, CM ;
Luttmer, JD ;
Smith, DM ;
Ramos, TA .
MRS BULLETIN, 1997, 22 (10) :39-42
[6]   SiO2 aerogel film as a novel intermetal dielectric [J].
Jo, MH ;
Park, HH ;
Kim, DJ ;
Hyun, SH ;
Choi, SY ;
Paik, JT .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (03) :1299-1304
[7]  
Maxwell-Garnett J C, 1904, PHILOS T ROY SOC LON, V203, P385, DOI DOI 10.1098/RSTA.1904.0024
[8]  
MURRAY C, 2001, IN PRESS P EUR WORKS
[9]   Surface modified spin-on xerogel films as interlayer dielectrics [J].
Nitta, SV ;
Pisupatti, V ;
Jain, A ;
Wayner, PC ;
Gill, WN ;
Plawsky, JL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (01) :205-212
[10]   SILICA AEROGEL FILMS AT AMBIENT-PRESSURE [J].
PRAKASH, SS ;
BRINKER, CJ ;
HURD, AJ .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 190 (03) :264-275