Bond-length variation in InxGa1-xAs/InP strained epitaxial layers

被引:52
作者
Romanato, F
De Salvador, D
Berti, M
Drigo, A
Natali, M
Tormen, M
Rossetto, G
Pascarelli, S
Boscherini, F
Lamberti, C
Mobilio, S
机构
[1] European Synchrotron Radiat Facil, INFM, F-38043 Grenoble, France
[2] Dipartimento Fis G Galilei, Ist Nazl Fis Mat, I-35131 Padua, Italy
[3] CNR, Ist Chim Tecn Inorgan Mat Avanzati, I-35020 Padova, Italy
[4] Ist Nazl Fis Nucl, Lab Nazl Frascati, I-00044 Frascati, Italy
[5] Univ Torino, Dipartimento Chim Inorgan Fis Mat, I-10418 Turin, Italy
[6] Univ Roma Tre, Dipartimento Fis, I-00146 Roma, Italy
来源
PHYSICAL REVIEW B | 1998年 / 57卷 / 23期
关键词
D O I
10.1103/PhysRevB.57.14619
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tensile and compressive InxGa1-xAs epilayers gram on [001] InP substrates have been analyzed by fluorescence-detected x-ray-absorption. fine structure in order to investigate the length variation suffered by Ga-As and In-As atomic bonds under epitaxial strain. A morphological and structural analysis-had previously been performed in order to select only pseudomorphic samples with high lattice quality. A clear variation of the nearest-neighbor distances proportional to the tetragonal distortion of the film has been detected. We discuss the relationship between the long- and short-range descriptions of strain accommodation in the framework of an analytical model.
引用
收藏
页码:14619 / 14622
页数:4
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