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Correlation between hardness and structure of carbon-nitride thin films obtained by reactive pulsed laser deposition

被引：17
作者：
György, E
Nelea, V
Mihailescu, IN
Perrone, A
Pelletier, H
Cornet, A
Ganatsios, S
Werckmann, J
机构：
[1] Natl Inst Laser Plasma & Radiat Phys, Lasers Dept, RO-76900 Bucharest V, Romania
[2] Univ Lecce, Dept Phys, I-73100 Lecce, Italy
[3] Ist Nazl Fis Mat, I-73100 Lecce, Italy
[4] ENSAIS, LISS, F-67000 Strasbourg, France
[5] Tech Educ Inst, Kozani, Greece
[6] IPCMS, UMR 7504, CNRS, Grp Surfaces Interfaces, F-67037 Strasbourg, France
来源：
THIN SOLID FILMS | 2001年 / 388卷 / 1-2期
关键词：
laser ablation; nitrides; X-ray photoelectron spectroscopy (XPS); hardness;
D O I：
10.1016/S0040-6090(01)00840-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon-nitride thin films were synthesized by reactive pulsed laser deposition from graphite targets in low-pressure nitrogen. X-Ray photoelectron spectroscopy and nanoindentation measurements were performed in order to establish a connection between the composition, structure and hardness of the obtained thin films. We studied the variation of the sp(3)/sp(2) C bonded to N ratio with the increase of the N content of the thin layers. We found that the value of this ratio mainly determines the hardness of the carbon-nitride layers. The stability in time and/or under thermal heating of the CN bonds formed was also tested. (C) 2001 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码：93 / 100
页数：8
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