Magnetron plasma structure with strong magnetic field

被引:14
作者
Shidoji, E
Makabe, T
机构
[1] Asahi Glass Co Ltd, Res Ctr, Kanagawa Ku, Yokohama, Kanagawa 2218755, Japan
[2] Keio Univ, Dept Elect & Elect Engn, Yokohama, Kanagawa 2238522, Japan
关键词
computer simulation; glow discharge; plasma processing and depostition; sputtering;
D O I
10.1016/S0040-6090(03)00933-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We perform simulations of the magnetron plasma under a strong magnetic field as well as the conventional magnetic field in the cylindrical geometry in order to examine the typical plasma structure of the magnetron with a strong magnetic field. In the case of the strong magnetic field, an electric field is formed even in the outside region of the sheath. Because the electron diffusion is strongly suppressed by the strong magnetic field, the electron diffusion to the anode is enforced by the electric field in the outside region of the sheath in order to sustain the plasma. Due to the additional electric field, the distributions of the net generation rate and the number density of the plasma are broadened to the anode direction. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:27 / 31
页数:5
相关论文
共 14 条
[1]  
BIRDSALL CK, 1985, PLASMA PHYSICS VIA C, P19
[2]  
CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P87
[3]  
Ellis H. W., 1976, Atomic Data and Nuclear Data Tables, V17, P177, DOI 10.1016/0092-640X(76)90001-2
[4]   LOW RESISTIVITY INDIUM TIN OXIDE TRANSPARENT CONDUCTIVE FILMS .2. EFFECT OF SPUTTERING VOLTAGE ON ELECTRICAL PROPERTY OF FILMS [J].
ISHIBASHI, S ;
HIGUCHI, Y ;
OTA, Y ;
NAKAMURA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :1403-1406
[5]   Tomographic imagings of a plasma structure and sputtered particle in a direct current magnetron discharge [J].
Itoh, A ;
Makabe, T ;
Shimura, N ;
Tougo, S .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1996, 24 (01) :109-110
[6]   MODELING AND DIAGNOSTICS OF THE STRUCTURE OF RF GLOW-DISCHARGES IN AR AT 13.56 MHZ [J].
MAKABE, T ;
NAKANO, N ;
YAMAGUCHI, Y .
PHYSICAL REVIEW A, 1992, 45 (04) :2520-2531
[7]  
NANBU K, 1994, PROGR ASTRONAUT AERO, V160, P428
[8]   ELECTRON-IMPACT CROSS-SECTIONS FOR ARGON [J].
PETERSON, LR ;
ALLEN, JE .
JOURNAL OF CHEMICAL PHYSICS, 1972, 56 (12) :6068-&
[9]   INDUCED DRIFT CURRENTS IN CIRCULAR PLANAR MAGNETRONS [J].
ROSSNAGEL, SM ;
KAUFMAN, HR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (01) :88-91
[10]   An anomalous erosion of a rectangular magnetron system [J].
Shidoji, E ;
Nemoto, M ;
Nomura, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (06) :2858-2863