Ge nanostructures: average and local structure

被引:7
作者
Kolobov, AV [1 ]
机构
[1] AIST, Ctr Appl Near Field Opt Res, Tsukuba, Ibaraki 3058562, Japan
关键词
D O I
10.1023/B:JMSE.0000012455.87480.9b
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A review of an important class of electronic materials, namely, Ge nanostructures, is given. This paper first discusses the geometrical aspects of the nanostructures, both epitaxially grown quantum dots and embedded nanocrystals. This is followed by a description of the structure. Structural techniques relying on long-range ordering, such as diffraction, are compared to methods depending on local bonding, namely Raman scattering and X-ray absorption fine structure. Merits and pitfalls of various techniques are also discussed. The review is concluded by a discussion of possible advanced applications of Ge nanostructures. (C) 2004 Kluwer Academic Publishers.
引用
收藏
页码:195 / 203
页数:9
相关论文
共 120 条
[1]   Real-space multiple-scattering calculation and interpretation of x-ray-absorption near-edge structure [J].
Ankudinov, AL ;
Ravel, B ;
Rehr, JJ ;
Conradson, SD .
PHYSICAL REVIEW B, 1998, 58 (12) :7565-7576
[2]  
APARISI A, 1996, SOLID STATE ELECT, V40
[3]   COULOMB BLOCKADE OF SINGLE-ELECTRON TUNNELING, AND COHERENT OSCILLATIONS IN SMALL TUNNEL-JUNCTIONS [J].
AVERIN, DV ;
LIKHAREV, KK .
JOURNAL OF LOW TEMPERATURE PHYSICS, 1986, 62 (3-4) :345-373
[4]   Electron transport in Ge nanocrystalline films deposited using the cluster beam evaporation technique [J].
Banerjee, S ;
Nozaki, S ;
Morisaki, H .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (07) :4307-4311
[5]   Coulomb-blockade effect observed at room temperature in Ge nanocrystalline films deposited by the cluster-beam evaporation technique [J].
Banerjee, S ;
Nozaki, S ;
Morisaki, H .
APPLIED PHYSICS LETTERS, 2000, 76 (04) :445-447
[6]   Ge-Si intermixing in Ge quantum dots on Si(001) and Si(111) [J].
Boscherini, F ;
Capellini, G ;
Di Gaspare, L ;
Rosei, F ;
Motta, N ;
Mobilio, S .
APPLIED PHYSICS LETTERS, 2000, 76 (06) :682-684
[7]   Ge-Si intermixing in Ge quantum dots on Si [J].
Boscherini, F ;
Capellini, G ;
Di Gaspare, L ;
De Seta, M ;
Rosei, F ;
Sgarlata, A ;
Motta, N ;
Mobilio, S .
THIN SOLID FILMS, 2000, 380 (1-2) :173-175
[8]   Chemical vapor deposition topotaxy in porous hosts [J].
Bowes, CL ;
Malek, A ;
Ozin, GA .
CHEMICAL VAPOR DEPOSITION, 1996, 2 (03) :97-103
[9]   Si/Ge nanostructures [J].
Brunner, K .
REPORTS ON PROGRESS IN PHYSICS, 2002, 65 (01) :27-72
[10]   A NEW DENSE FORM OF SOLID GERMANIUM [J].
BUNDY, FP ;
KASPER, JS .
SCIENCE, 1963, 139 (355) :340-&