Dielectric properties of PbZrxTi1-xO3/PbZrO3 multilayer thin films

被引:11
作者
Bae, SH [1 ]
Jeon, KB
Jin, BM
机构
[1] Dong A Univ, Dept Phys, Pusan 604714, South Korea
[2] Dong Eui Univ, Dept Phys, Pusan 614714, South Korea
关键词
thin films; sol-gel chemistry; X-ray diffraction; crystal structure;
D O I
10.1016/S0025-5408(01)00699-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Multilayered thin films of Perovskite structure were fabricated by the sol-gel method. The effects of various stacking and annealing sequences of PbZrO3/Pb(Zr,Ti)O-3 (PZ/PZT) multilayered thin films that were related to the structural and dielectric properties were investigated. The samples of PZ/annealing/PZT/annealing, PZT/annealing/PZ/annealing films have PZ and PZT structures together. But PZ/PZT/annealing, PZT/PZ/annealing films have mixed phases of PZ and PZT. PZ-based multilayered thin films have more antiferroelectric properties than that of PZT-based films. The results of X-ray, dielectric constants as a function of temperature, photographs of scanning electron microscope (SEM), and D-E hysteresis loop measurement were explained together. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1931 / 1937
页数:7
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