Making of specific electrodes by CVD

SnO2 thin films were deposited on Ti substrates by metal-organic chemical vapor deposition using the reactive gas mixture SnEt4-O-2 to prepare electrode materials. A kinetic study of the growth process has been carried out as a function of the deposition parameters and a simulation model of the growth rate was used to obtain rapidly thickness variations on flat substrates of less than 2% along the axis of the reactor over an isothermal length of 150 mm long. This deposition process has been used for the preparation of SnO2/Ti electrodes subsequently used in the electrochemical treatment of industrial wastewater. (C) 1998 Published by Elsevier Science S.A.