Atomic structures and growth morphologies of electrodeposited Te film on Au(100) and Au(111) observed by in situ atomic force microscopy

被引：34

作者：

Ikemiya, N ^{[1
]}

Iwai, D ^{[1
]}

Yamada, K ^{[1
]}

Vidu, R ^{[1
]}

Hara, S ^{[1
]}

机构：

[1] POLYTECH UNIV,DEPT MAT SCI & ENGN,BUCHAREST,ROMANIA

来源：

SURFACE SCIENCE | 1996年 / 369卷 / 1-3期

关键词：

atomic force microscopy; epitaxy; gold; metal-electrolyte interfaces; tellurium;

D O I：

10.1016/S0039-6028(96)00881-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have investigated the atomic structures as well as the growth morphorogies of electrodeposited Te films on Au(100) and Au(111) with large lattice misfits from sulfuric acid solutions using in situ atomic force microscopy. On both Au(100) and Au(111) substrates, bulk deposited Te films were formed by a Stranski-Krastanov mechanism even at a slow deposition rate of ca. 0.5 ML/min, which suggests that the surface diffusion process of Te adatoms on a monolayer-Te-coated Au surface is extremely slow. We have found that the atomic structures of Te films changed with increasing him thickness. On both the Au(100) and Au(111) substrates, the data suggested that Te(10 (1) over bar 0) films were grown through several types of relaxation layers.

引用

页码：199 / 208

页数：10

共 8 条

[1] ELECTROCHEMICAL ATOMIC LAYER EPITAXY (ECALE) [J].