Patterned deposition by plasma enhanced spatial atomic layer deposition

被引：19

作者：

Poodt, Paul ^{[1
]}

Kniknie, Bas ^{[1
]}

Branca, Annalisa ^{[1
]}

Winands, Hans ^{[1
]}

Roozeboom, Fred ^{[1
,2
]}

机构：

[1] TNO, NL-5600 HE Eindhoven, Netherlands

[2] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

来源：

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2011年 / 5卷 / 04期

关键词：

atomic layer deposition; plasma-enhanced deposition; patterning; alumina;

D O I：

10.1002/pssr.201004542

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An atmospheric pressure plasma enhanced atomic layer deposition reactor has been developed, to deposit Al2O3 films from trimethyl aluminum and an He/O-2 plasma. This technique can be used for 2D patterned deposition in a single in-line process by making use of switched localized plasma sources. It was observed that the sharpness of the patterns is primarily influenced by the concentration of reactive plasma species and by the dimensions of the plasma source. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

收藏

页码：165 / 167

页数：3

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