Effects of thermal and hydrogen treatment on indium segregation in InGaN/GaN multiple quantum wells

被引:83
作者
Moon, YT [1 ]
Kim, DJ
Song, KM
Choi, CJ
Han, SH
Seong, TY
Park, SJ
机构
[1] Kwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[2] Kwangju Inst Sci & Technol, Ctr Optoelect Mat Res, Kwangju 500712, South Korea
关键词
D O I
10.1063/1.1370368
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of indium segregation and hydrogen on the optical and structural properties of InGaN/GaN multiple quantum wells, grown by metalorganic chemical vapor deposition were investigated. Photoluminescence and high-resolution transmission electron microscopy analysis showed that two types of indium-rich regions can be formed in the InGaN well layers. Self-assembled quantum dot-like indium-rich regions were found in the well layer grown at a normal growth temperature. These regions behaved as luminescent centers, showing a maximum indium content at the center of indium-rich region. However, randomly-distributed indium-segregated regions, which formed near the upper interface of the InGaN well layers during the subsequent high-temperature annealing process led to the degradation of the optical properties by generating defects such as misfit dislocations. The use of hydrogen during the growth interruption was found to be very effective in suppressing the formation of indium-segregated regions in the InGaN well layers. (C) 2001 American Institute of Physics.
引用
收藏
页码:6514 / 6518
页数:5
相关论文
共 33 条
[1]   Indium incorporation during the growth of InGaN by molecular-beam epitaxy studied by reflection high-energy electron diffraction intensity oscillations [J].
Adelmann, C ;
Langer, R ;
Feuillet, G ;
Daudin, B .
APPLIED PHYSICS LETTERS, 1999, 75 (22) :3518-3520
[2]   Crystal growth and conductivity control of group III nitride semiconductors and their application to short wavelength light emitters [J].
Akasaki, I ;
Amano, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (9A) :5393-5408
[3]   Incorporation of indium during molecular beam epitaxy of InGaN [J].
Bottcher, T ;
Einfeldt, S ;
Kirchner, V ;
Figge, S ;
Heinke, H ;
Hommel, D ;
Selke, H ;
Ryder, PL .
APPLIED PHYSICS LETTERS, 1998, 73 (22) :3232-3234
[4]  
CHEN H, 1999, MRS INTERNET J N S R, V451, P695
[5]   Luminescences from localized states in InGaN epilayers [J].
Chichibu, S ;
Azuhata, T ;
Sota, T ;
Nakamura, S .
APPLIED PHYSICS LETTERS, 1997, 70 (21) :2822-2824
[6]   Phase separation in InGaN grown by metalorganic chemical vapor deposition [J].
El-Masry, NA ;
Piner, EL ;
Liu, SX ;
Bedair, SM .
APPLIED PHYSICS LETTERS, 1998, 72 (01) :40-42
[7]   GaInN GaN multiple-quantum-well light-emitting diodes grown by molecular beam epitaxy [J].
Grandjean, N ;
Massies, J ;
Dalmasso, S ;
Vennéguès, P ;
Siozade, L ;
Hirsch, L .
APPLIED PHYSICS LETTERS, 1999, 74 (24) :3616-3618
[8]   Influence of surface structure on segregation and alloy properties in (100)- and (311)-oriented InGaAs/GaAs heterostructures [J].
Guimaraes, FEG ;
GonzalezBorrero, PP ;
Lubyshev, D ;
Basmaji, P .
SOLID-STATE ELECTRONICS, 1996, 40 (1-8) :659-663
[9]   Solid phase immiscibility in GaInN [J].
Ho, IH ;
Stringfellow, GB .
APPLIED PHYSICS LETTERS, 1996, 69 (18) :2701-2703
[10]   IMPROVED COMPOSITIONAL ABRUPTNESS AT THE INGAAS ON GAAS INTERFACE BY PRESATURATION WITH IN DURING MOLECULAR-BEAM EPITAXY [J].
KASPI, R ;
EVANS, KR .
APPLIED PHYSICS LETTERS, 1995, 67 (06) :819-821