Design of a silicon-based field-effect electro-optic modulator with enhanced light-charge interaction

被引:8
作者
Kekatpure, RD [1 ]
Brongersma, ML
Shenoy, RS
机构
[1] Stanford Univ, Geballe Lab Adv Mat, Stanford, CA 94305 USA
[2] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
关键词
D O I
10.1364/OL.30.002149
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A new design for an all-silicon field-effect optical modulator in a ring resonator geometry is proposed and modeled by means of finite-element method simulations. It is shown that the optimal relative placement of the ultrathin field-effect-generated charge layers and the optical mode in the strong-confinement waveguides leads to more than an order-of-magnitude enhancement in the light-charge interaction compared with the recent predictions in the literature. We show that such an enhancement could provide optical modulation with a > 7 dB extinction-ratio using a voltage swing of only 2 V, thus making our design compatible with complementary metal-oxide semiconductor technology. (c) 2005 Optical Society of America.
引用
收藏
页码:2149 / 2151
页数:3
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