Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFeO3 films

被引：139

作者：

Kim, Dae Ho ^{[1
]}

Lee, Ho Nyung ^{[1
]}

Biegalski, Michael D. ^{[2
]}

Christen, Hans M. ^{[1
,2
]}

机构：

[1] Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA

[2] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 01期

关键词：

D O I：

10.1063/1.2830799

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Multiferroic BiFeO3 epitaxial films with thicknesses ranging from 40 to 960 nm were grown by pulsed laser deposition on SrTiO3 (001) substrates with SrRuO3 bottom electrodes. X-ray characterization shows that the structure evolves from angularly distorted tetragonal with c/a approximate to 1.04 to more bulklike distorted rhombohedral (c/a approximate to 1.01) as the strain relaxes with increasing thickness. Despite this significant structural evolution, the ferroelectric polarization along the body diagonal of the distorted pseudocubic unit cells, as calculated from measurements along the normal direction, barely changes. (c) 2008 American Institute of Physics.

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页数：3

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