CMOS foundry-based micromachining

被引:17
作者
Tilmans, HAC [1 ]
Baert, K [1 ]
Verbist, A [1 ]
Puers, R [1 ]
机构
[1] IMEC VZW,DIVISIE MAP,B-3001 HEVERLEE,BELGIUM
关键词
D O I
10.1088/0960-1317/6/1/030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports on the first results of a study of the possibilities of the fabrication of micromechanical structures for microsystems applications in a regular MPC run of a standard CMOS process, followed by post-processing. Two post-processing modules, i.e., the frontside bulk etching module and the surface micromachining module are investigated. Examples of the former are suspended spiral coils for high-frequency applications and of the latter, metal bridge resonators.
引用
收藏
页码:122 / 127
页数:6
相关论文
共 17 条
[1]   CMOS AS SENSOR TECHNOLOGY [J].
BALTES, H .
SENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 :51-56
[2]  
BOLTSHAUSER T, 1991, SENSOR ACTUAT A-PHYS, V25, P509
[3]   LARGE SUSPENDED INDUCTORS ON SILICON AND THEIR USE IN A 2-MU-M CMOS RF AMPLIFIER [J].
CHANG, JYC ;
ABIDI, AA ;
GAITAN, M .
IEEE ELECTRON DEVICE LETTERS, 1993, 14 (05) :246-248
[4]  
CROLS J, 1995, STRUCTURES CURRENTLY
[5]  
FORSTER H, 1995, MST NEWS, V12, P20
[6]  
GAJDA JJ, 1974, ANN P RELIAB PHYS, V12, P30
[7]   FABRICATION OF MICROMECHANICAL DEVICES FROM POLYSILICON FILMS WITH SMOOTH SURFACES [J].
GUCKEL, H ;
SNIEGOWSKI, JJ ;
CHRISTENSON, TR ;
MOHNEY, S ;
KELLY, TF .
SENSORS AND ACTUATORS, 1989, 20 (1-2) :117-122
[8]   SURFACE MICROMACHINING FOR MICROSENSORS AND MICROACTUATORS [J].
HOWE, RT .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1809-1813
[9]   ELECTROSTATICALLY DRIVEN VACUUM-ENCAPSULATED POLYSILICON RESONATORS .1. DESIGN AND FABRICATION [J].
LEGTENBERG, R ;
TILMANS, HAC .
SENSORS AND ACTUATORS A-PHYSICAL, 1994, 45 (01) :57-66
[10]   A HIGH-SENSITIVITY CMOS GAS-FLOW SENSOR ON A THIN DIELECTRIC MEMBRANE [J].
MOSER, D ;
BALTES, H .
SENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 :33-37