DNA microarrays: An imaging study

被引:7
作者
Kim, C [1 ]
Li, M
Lowe, A
Venkataramaiah, N
Richmond, K
Kaysen, J
Cerrina, F
机构
[1] Univ Wisconsin, Ctr Nanotechnol, Madison, WI 53706 USA
[2] Univ Wisconsin, ECE Dept, Madison, WI 53706 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 06期
关键词
D O I
10.1116/1.1627802
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
DNA chips are used to study the composition of genetic material. We report the results of an experimental study of the synthesis of DNA microarrays using a maskless photodeprotection process. In these "chips," the quality of the final product is dependent on the type and frequency of errors in the synthesis of the oligonucleotides. Contrary to photoresist, the photochemistry is linear and thus more prone to the introduction of defects. To understand and characterize the exposure process, we have developed a theoretical image formation model based on standard lithographic modeling tools. Experimentally, we have used a microarray synthesizer similar to that described in (Ref. 1), but using an argon ion laser as radiation source. To characterize the process, we have acquired aerial images using a CCD camera, a photosensitive film, and fluorescence image of a T-base monomer. We will discuss the imaging properties of the optical system, the models used to analyze the data and the relation between measured images and DNA stepwise synthesis yield. (C) 2003 American Vacuum Society.
引用
收藏
页码:2946 / 2950
页数:5
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