Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy

被引:87
作者
Mercère, P
Zeitoun, P
Idir, M
Le Pape, S
Douillet, D
Levecq, X
Dovillaire, G
Bucourt, S
Goldberg, KA
Naulleau, PP
Rekawa, S
机构
[1] Univ Paris 11, Lab Interact Rayonnement X Avec Mat, F-91405 Orsay, France
[2] Imagine Opt, F-91400 Orsay, France
[3] Ecole Natl Super Tech Avancees, Ecole Polytech, Lab Opt Appliquee, F-91761 Palaiseau, France
[4] Ernest Orlando Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
关键词
D O I
10.1364/OL.28.001534
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report, for the first time to our knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range. The reference wave front needed to calibrate the sensor was generated by spatially filtering a focused undulator beam with 1.7- and 0.6-mum-diameter pinholes. To fully characterize the sensor, accuracy and sensitivity measurements were performed. The incident beam's wavelength was varied from 7 to 25 nm. Measurements of accuracy better than lambda(EUV)/120 (0.11 nm) were obtained at lambda(EUV) = 13.4 nm. The aberrations introduced by an additional thin mirror, as well as wave front of the spatially unfiltered incident beam, were also measured. (C) 2003 Optical Society of America.
引用
收藏
页码:1534 / 1536
页数:3
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