Optical deflection setup for stress measurements in thin films

被引：19

作者：

Bicker, M

von Hulsen, U

Laudahn, U

Pundt, A

Geyer, U

机构：

[1] Univ Gottingen, Fak Phys, D-37073 Gottingen, Germany

[2] Univ Gottingen, SFB 345, D-37073 Gottingen, Germany

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1998年 / 69卷 / 02期

关键词：

D O I：

10.1063/1.1148721

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We demonstrate an optical two-beam deflection setup for irt situ stress measurements in thin films. By using improved position sensitive photodetectors we reach a resolution of better than 10(-4) m(-1) for substrate curvature measurement at a bandwidth of 1 kHz, with a relatively short optical path of 0.53 m and without employing a lock-in technique. (C) 1998 American Institute of Physics.

引用

收藏

页码：460 / 462

页数：3

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