Thick films of X-ray polycrystalline mercuric iodide detectors

被引：90

作者：

Schieber, M ^{[1
]}

Hermon, H

Zuck, A

Vilensky, A

Melekhov, L

Shatunovsky, R

Meerson, E

Saado, Y

Lukach, M

Pinkhasy, E

Ready, SE

Street, RA

机构：

[1] Hebrew Univ Jerusalem, Grad Sch Appl Sci, IL-91904 Jerusalem, Israel

[2] Sandia Natl Labs, Livermore, CA 94550 USA

[3] Real time Radiog Readout, IL-91487 Jerusalem, Israel

[4] Xerox Corp, Palo Alto Res Ctr, Palo Alto, CA 94304 USA

来源：

JOURNAL OF CRYSTAL GROWTH | 2001年 / 225卷 / 2-4期

关键词：

physical vapor deposition processes; polycrystalline deposition; semiconducting mercury compounds;

D O I：

10.1016/S0022-0248(01)00832-6

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Polycrystalline HgI2 thick film detectors are among the leading semiconductor materials to be used as direct converters in X-ray digital radiography. Their properties along with a survey of the properties of alternative materials, such as PbI2 or A-Se, will be given. The preparation of HgI detector plates, both by direct evaporation (Physical vapor deposition, (PVD)) and by binding the individual crystallites with polymeric glue, forming screen-printed (SP) detector plates, will be described. The microstructure of the PVD thick films showing a columnar morphology, as determined by SEM measurements, will be shown. The X-ray response to radiological X-ray generator of 85 kVp using the current integration mode will be reported for both PVD and SP films. Finally, some X-ray images taken at Xerox-Parc using HgI, polycrystalline detectors will be shown. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：118 / 123

页数：6

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