Phase transition between c(4x2) and p(2x2) structures of the Si(100) surface at 6K caused by the fluctuation of phase defects on dimer rows due to dimer flip-flop motion

被引:44
作者
Shigekawa, H
Miyake, K
Ishida, M
Hata, K
Oigawa, H
Nannichi, Y
Yoshizaki, R
Kawazu, A
Abe, T
Ozawa, T
Nagamura, T
机构
[1] UNIV TSUKUBA, TSUKUBA ADV RES ALLIANCE, CTR TARA, TSUKUBA, IBARAKI 305, JAPAN
[2] UNISOKU CO LTD, HIRAKATA, OSAKA 57301, JAPAN
[3] UNIV TSUKUBA, INST APPL PHYS, TSUKUBA, IBARAKI 305, JAPAN
[4] UNIV TSUKUBA, CRYOGEN CTR, TSUKUBA, IBARAKI 305, JAPAN
[5] UNIV TOKYO, DEPT APPL PHYS, TOKYO 113, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1996年 / 35卷 / 8B期
关键词
STM; Si(100); surface reconstruction; dimer; c(4x2); p(2x2);
D O I
10.1143/JJAP.35.L1081
中图分类号
O59 [应用物理学];
学科分类号
摘要
Dimers of the Si(100) surface previously observed at 120-140 K, which partially appeared to be symmetric, were frozen at 6 K, and an atomically resolved structural change between c(4 x 2) and p(2 x 2) arrangements of the Si(100) surface was observed for the first time by scanning tunneling microscopy. The observed change was due to the fluctuation of phase defects of a new type on dimer rows, which have a structure similar to that of the type-C defect. Dimer flip-flop motion at the phase boundary which induces the apparent phase transition; and creation and annihilation of the anti-phase domain were clearly observed.
引用
收藏
页码:L1081 / L1084
页数:4
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