Inexpensive set-up for determination of decomposition temperature for volatile compounds

被引：16

作者：

Nilsen, O ^{[1
]}

Fjellvåg, H ^{[1
]}

Kjekshus, A ^{[1
]}

机构：

[1] Univ Oslo, Dept Chem, N-0315 Oslo, Norway

来源：

THERMOCHIMICA ACTA | 2003年 / 404卷 / 1-2期

关键词：

thermal decomposition; ALCVD; ALD; ALE; CVD; beta-diketonate; VO(thd)(2); Cr(thd)(3); Mn(thd)(3); Fe(thd)(3); Co(thd)(2); Ni(thd)(2); Cu(thd)(2); Zn(thd)(2); La(thd)(3); Ca(thd)(2);

D O I：

10.1016/S0040-6031(03)00149-7

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The utility of precursors for atomic layer chemical vapour deposition (ALCVD) growth is limited by the sublimation and decomposition temperatures. Sublimation temperatures are conveniently obtained by thermogravimetry (TG) under vacuum. We present here a relatively inexpensive method to obtain information about the decomposition temperature for a precursor candidate for ALCVD. This approach requires an oven with a controlled temperature gradient and a long ampoule for each precursor. The precursors tested in this work comprise the thd complexes (Hthd = 2,2,6,6-tetramethylheptane-3,5-dione) of V, Cr, Mn, Fe, Co, Ni, Cu, Zn, La, and Ca. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：187 / 192

页数：6

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