Positron annihilation study of vacancy-like defects related to oxygen precipitates in Czochralski-type Si

被引:42
作者
Brusa, RS [1 ]
Deng, W
Karwasz, GP
Zecca, A
Pliszka, D
机构
[1] Univ Trent, Dipartimento Fis, Ist Nazl Fis Mat, I-38050 Povo, TN, Italy
[2] Pedag Univ, Inst Phys, PL-76200 Slupsk, Poland
关键词
D O I
10.1063/1.1401782
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the direct measurement of vacancy-like defects related to oxygen in the oxygen precipitation process in Czochralski Si. The vacancy-like defects were detected by measuring the positron lifetime and narrowing of the positron-electron annihilation momentum distribution. Oxygen atoms surrounding the vacancy-like defects were detected by analyzing the high-momentum part of the positron-electron momentum distribution measured by a Doppler broadening coincidence technique. It was found that the majority of the defects associated with oxygen have an effective open volume smaller than that of a silicon monovacancy. (C) 2001 American Institute of Physics.
引用
收藏
页码:1492 / 1494
页数:3
相关论文
共 23 条
  • [1] IDENTIFICATION OF VACANCY DEFECTS IN COMPOUND SEMICONDUCTORS BY CORE-ELECTRON ANNIHILATION - APPLICATION TO INP
    ALATALO, M
    KAUPPINEN, H
    SAARINEN, K
    PUSKA, MJ
    MAKINEN, J
    HAUTOJARVI, P
    NIEMINEN, RM
    [J]. PHYSICAL REVIEW B, 1995, 51 (07): : 4176 - 4185
  • [2] Nucleation and formation of oxygen precipitates in Czochralski grown silicon annealed under uniform stress conditions
    Antonova, IV
    Misiuk, A
    Popov, VP
    Plotnikov, AE
    Surma, B
    [J]. PHYSICA B-CONDENSED MATTER, 1998, 253 (1-2) : 131 - 137
  • [3] OXYGEN PRECIPITATION IN SILICON
    BORGHESI, A
    PIVAC, B
    SASSELLA, A
    STELLA, A
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 77 (09) : 4169 - 4244
  • [4] Formation of vacancy clusters and cavities in He-implanted silicon studied by slow-positron annihilation spectroscopy
    Brusa, RS
    Karwasz, GP
    Tiengo, N
    Zecca, A
    Corni, F
    Tonini, R
    Ottaviani, G
    [J]. PHYSICAL REVIEW B, 2000, 61 (15) : 10154 - 10166
  • [5] OXYGEN IN SILICON - A POSITRON-ANNIHILATION INVESTIGATION
    DANNEFAER, S
    KERR, D
    [J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (04) : 1313 - 1321
  • [6] VACANCY-TYPE DEFECTS IN CRYSTALLINE AND AMORPHOUS SIO2
    DANNEFAER, S
    BRETAGNON, T
    KERR, D
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (02) : 884 - 890
  • [7] FUSEGAWA I, 1992, MATER RES SOC SYMP P, V262, P683, DOI 10.1557/PROC-262-683
  • [8] Momentum distributions of electron-positron pairs annihilating at vacancy clusters in Si
    Hakala, M
    Puska, MJ
    Nieminen, RM
    [J]. PHYSICAL REVIEW B, 1998, 57 (13): : 7621 - 7627
  • [10] Photoionization of the silicon divacancy studied by positron-annihilation spectroscopy
    Kauppinen, H
    Corbel, C
    Nissila, J
    Saarinen, K
    Hautojarvi, P
    [J]. PHYSICAL REVIEW B, 1998, 57 (20) : 12911 - 12922