Femtosecond two-photon stereo-lithography

被引:120
作者
Miwa, M [1 ]
Juodkazis, S [1 ]
Kawakami, T [1 ]
Matsuo, S [1 ]
Misawa, H [1 ]
机构
[1] Univ Tokushima, Fac Engn, Tokushima 7708506, Japan
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2001年 / 73卷 / 05期
关键词
D O I
10.1007/s003390100934
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report herein a method for the three-dimensional (3D) fabrication of microstructures by means of direct fs-beam writing (scanning) inside a polymerizable resin. Photopolymerization takes place via two-photon absorption (TPA), as indicated by measurements of transmission power dependence. This concept of fabrication is based on two principles: the use of short, sub-picosecond pulses and simultaneous tight focusing (numerical aperture. NA > 1), This approach creates a unique opportunity for avoiding self-focusing even at very high intensities, as the power is lower than the self-focusing threshold. Under such conditions, no filament formation takes place and no thermal convection disturbance occurs in the focal vicinity during photo-polymerization. This technique requires no sacrificial layers or structures in real 3D micro-stereo-lithography.
引用
收藏
页码:561 / 566
页数:6
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