Influence of annealing temperature and atmosphere on the properties of ITO films deposited using a powdery target

被引：15

作者：

Lee, Jaehyeong

Lim, D.-G.

Song, Woochang

Yi, Junsin ^{[1
]}

机构：

[1] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, South Korea

[2] Kunsan Natl Univ, Sch Elect & Informat Engn, Kunsan 573701, South Korea

[3] Chungju Natl Univ, Dept Elect Engn, Chungju 380702, South Korea

[4] Kangwon Natl Univ, Dept Elect Engn, Samcheok 245711, South Korea

来源：

JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2007年 / 51卷 / 03期

关键词：

indium tin oxide (ITO) film; heat treatment; magnetron sputtering; powdery target;

D O I：

10.3938/jkps.51.1143

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Indium tin oxide (ITO) films have been prepared by r.f. magnetron sputtering. In order to improve the utilization efficiency of the target and reduce the cost of the film deposition processes, we used a powdery target instead of a conventional ceramic target. As-deposited films were annealed at temperatures between 100 degrees C and 500 degrees C for 30 min in various atmospheres, such as air, 02, H-2, N-2 and vacuum. The effects of the heat treatment conditions on the structural, the electrical, and theoptical properties of ITO films were investigated.

引用

页码：1143 / 1146

页数：4

共 16 条

[1]

Cho S, 2006, J KOREAN PHYS SOC, V48, P468

[2] Room temperature deposition of ITO using r.f. magnetron sputtering [J].