Electrical characterization of nanocrystalline carbon-silicon heterojunctions

被引:24
作者
Hastas, NA [1 ]
Dimitriadis, CA [1 ]
Tassis, DH [1 ]
Logothetidis, S [1 ]
机构
[1] Univ Thessaloniki, Dept Phys, GR-54006 Salonika, Greece
关键词
D O I
10.1063/1.1390488
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanocrystalline carbon (nc-C) films were grown by magnetron sputtering on n-type Si substrates at room temperature and at substrate bias voltage -200 V. The electrical transport properties of nc-C/n-Si heterojunctions are investigated by current-voltage measurements at various temperatures and capacitance-voltage measurements at room temperature. The results indicate that the forward conduction is determined by thermionic emission over a potential barrier of height 0.3 eV at temperatures above 180 K. At lower temperatures and low currents, multistep tunneling current dominates. At low reverse voltages, the reverse conduction is dominated by current generated within the depletion region, while at higher voltages the current is due to Poole-Frenkel emission. (C) 2001 American Institute of Physics.
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收藏
页码:638 / 640
页数:3
相关论文
共 14 条
[1]   SCHOTTKY-BARRIER CONTACTS OF TITANIUM NITRIDE ON N-TYPE SILICON [J].
DIMITRIADIS, CA ;
LOGOTHETIDIS, S ;
ALEXANDROU, I .
APPLIED PHYSICS LETTERS, 1995, 66 (04) :502-504
[2]   Contacts of titanium nitride to n- and p-type gallium nitride films [J].
Dimitriadis, CA ;
Karakostas, T ;
Logothetidis, S ;
Kamarinos, G ;
Brini, J ;
Nouet, G .
SOLID-STATE ELECTRONICS, 1999, 43 (10) :1969-1972
[3]   Microstructure and its effect on the conductivity of magnetron sputtered carbon thin films [J].
Dimitriadis, CA ;
Hastas, NA ;
Vouroutzis, N ;
Logothetidis, S ;
Panayiotatos, Y .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (12) :7954-7959
[4]   Noise characterization of sputtered amorphous carbon films [J].
Hastas, NA ;
Dimitriadis, CA ;
Panayiotatos, Y ;
Tassis, DH ;
Patsalas, P ;
Logothetidis, S .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (09) :5482-5484
[5]   PHOTOLUMINESCENCE FROM NANOCRYSTALLITES EMBEDDED IN HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION [J].
LIU, XN ;
WU, XW ;
BAO, XM ;
HE, YL .
APPLIED PHYSICS LETTERS, 1994, 64 (02) :220-222
[6]   Highly conductive and highly transparent n-type microcrystalline silicon thin films [J].
Martins, R ;
Macarico, A ;
Ferreira, I ;
Nunes, R ;
Bicho, A ;
Fortunato, E .
THIN SOLID FILMS, 1997, 303 (1-2) :47-52
[7]   CURRENT TRANSPORT MECHANISMS OF ELECTROCHEMICALLY DEPOSITED CDS/CSTE HETEROJUNCTION [J].
OU, SS ;
STAFSUDD, OM ;
BASOL, BM .
SOLID-STATE ELECTRONICS, 1984, 27 (01) :21-25
[8]   Combined electrical and mechanical properties of titanium nitride thin films as metallization materials [J].
Patsalas, P ;
Charitidis, C ;
Logothetidis, S ;
Dimitriadis, CA ;
Valassiades, O .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) :5296-5298
[9]   MECHANISM OF THE VISIBLE LUMINESCENCE IN POROUS SILICON [J].
QIN, GG ;
JIA, YQ .
SOLID STATE COMMUNICATIONS, 1993, 86 (09) :559-563
[10]   DEVELOPMENT OF HIGHLY CONDUCTIVE N-TYPE MU-C-SI-H FILMS AT LOW-POWER FOR DEVICE APPLICATIONS [J].
SAHA, SC ;
RAY, S .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) :5713-5720