All-epitaxial fabrication of thick, orientation-patterned GaAs films for nonlinear optical frequency conversion

被引:204
作者
Eyres, LA [1 ]
Tourreau, PJ
Pinguet, TJ
Ebert, CB
Harris, JS
Fejer, MM
Becouarn, L
Gerard, B
Lallier, E
机构
[1] Stanford Univ, Ctr Nonlinear Opt Mat, Stanford, CA 94305 USA
[2] THALES, Cent Rech Lab, F-91404 Orsay, France
关键词
D O I
10.1063/1.1389326
中图分类号
O59 [应用物理学];
学科分类号
摘要
Orientation-patterned GaAs (OPGaAs) films of 200 mum thickness have been grown by hydride vapor phase epitaxy (HVPE) on an orientation-patterned template fabricated by molecular beam epitaxy (MBE). Fabrication of the templates utilized only MBE and chemical etching, taking advantage of GaAs/Ge/GaAs heteroepitaxy to control the crystal orientation of the top GaAs film relative to the substrate. Antiphase domain boundaries were observed to propagate vertically under HVPE growth conditions so that the domain duty cycle was preserved through the thick GaAs for all domain periods attempted. Quasiphase-matched frequency doubling of a CO2 laser was demonstrated with the beam confocally focused through a 4.6 mm long OPGaAs film. (C) 2001 American Institute of Physics.
引用
收藏
页码:904 / 906
页数:3
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