Scaling the modulation bandwidth and phase efficiency of a silicon optical modulator

被引:35
作者
Liu, A [1 ]
Samara-Rubio, D [1 ]
Liao, L [1 ]
Paniccia, M [1 ]
机构
[1] Intel Corp, Photon Technol Lab, Santa Clara, CA 95054 USA
关键词
metal-oxide-semiconductor (MOS) capacitor; optical modulator; phase shifter; planar lightwave circuits; silicon photonies; silicon-on-insulator (SOI); waveguide;
D O I
10.1109/JSTQE.2005.845618
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present an optimized design and detailed simulation of an all-silicon optical modulator based on a silicon waveguide phase shifter containing a metal-oxide-semiconductor (MOS) capacitor. Based on a fully vectorial Maxwell mode solver, we analyze the modal characteristics of the silicon waveguide. We show that shrinking the waveguide size and reducing gate oxide thickness significantly enhances the phase modulation efficiency because of the optical field enhancement in the voltage induced charge layers of the MOS capacitor, which, in turn, induce refractive index modulation in silicon due to free carrier dispersion effects. We also analyze the device speed by transient semiconductor device modeling. As both optical absorption and modulation bandwidth increase with increasing doping concentration, we show that, with a nonuniform doping profile in the waveguide, balance between the device operation speed and optical loss can be realized. Our simulation suggests that a TE-polarized optical phase modulator with a bandwidth of 10 GHz and an on-chip optical loss less than 2 dB is achievable in silicon.
引用
收藏
页码:367 / 372
页数:6
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