A study of field electron emission from thin amorphous-carbon-nitride films

被引：10

作者：

Chen, J

Xu, NS ^{[1
]}

Wang, EG

Deng, SZ

Chen, DH

Wei, AX

机构：

[1] Zhongshan Univ, Dept Phys, Guangzhou 510275, Peoples R China

[2] Chinese Acad Sci, Inst Phys, State Key Lab Surface Sci, Beijing 100080, Peoples R China

来源：

CHINESE PHYSICS LETTERS | 1998年 / 15卷 / 07期

关键词：

D O I：

10.1088/0256-307X/15/7/026

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Significant field emission has been observed from thin (< 1000 Angstrom) amorphous-carbon-nitride (a-CN) films. X-ray photoelectron spectroscopy, infrared spectrometry, and UV-visible optical absorption spectrometry have been used to characterize the films. The field emission properties of the thin film have been studied by using a transparent anode imaging system. Ie is proposed that this class of films should be studied as candidates of coating material for cold cathode emitter, in order for one to benefit from their very high thermal conductivity and super hardness.

引用

页码：539 / 541

页数：3

共 15 条

[1]

AMARATUNGA GAJ, 1996, APPL PHYS LETT, V68, P2519

[2]

BAZIAN A, 1997, INT J REFRACT MET H, V15, P3

[3] Low field-induced electron emission phenomenon observed from the carbon containing thin films [J].