XRD and TEM study of heteroepitaxial growth of zirconia on magnesia single crystal

被引:42
作者
Guinebretiere, R [1 ]
Soulestin, B [1 ]
Dauger, A [1 ]
机构
[1] CNRS, ENSCI, UPRES 6015, Lab Mat Ceram & Traitements Surfaces, F-87065 Limoges, France
关键词
ZrO2; MgO; sol-gel; epitaxial film;
D O I
10.1016/S0040-6090(97)01121-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zirconia thin films have been deposited on magnesia (001) single-crystal substrates using a sol-gel precursor route. Thermal treatment at 600 degrees C induces the crystallization of polycrystalline thin films containing randomly oriented nanocrystals. Annealing at higher temperature gives rise to the appearance of a progressive heteroepitaxy and breakup of the film into islands. Polycrystalline tetragonal zirconia thin films, several tens nanometer thick, have been studied with an incident X-ray beam angle equal to several tenth degrees. The epitaxial growth has been characterized by XRD under controlled incidence angles and concurrently imaged by TEM on cross-sectional samples. The development of heteroepitaxied single-crystal islands results from abnormal growth of interfacial grains having a lower orientational free energy. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:197 / 201
页数:5
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