Electron-impact dissociation cross sections for CHF3 and C3F8

被引：16

作者：

Baio, J. E. ^{[1
]}

Yu, H. ^{[1
]}

Flaherty, D. W. ^{[1
]}

Winters, H. F. ^{[1
]}

Graves, D. B. ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2007年 / 40卷 / 22期

关键词：

D O I：

10.1088/0022-3727/40/22/017

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Absolute total dissociation cross sections, sigma(t,diss), by electron-impact are reported for CHF3 and C3F8 from 10 to 300 eV using the chemical gettering technique described by Winters and Inokuti (1982 Phys. Rev. A 25 1420). Data are concentrated in the near-threshold region (10-30 eV). The thresholds for dissociation of CHF3 and C3F8 are determined to be 10.4 eV and 11.9 eV, respectively. Ionization thresholds occur at 16 eV for CHF3 and 16.2 eV for C3F8. Neutral dissociation cross sections of both CHF3 and C3F8 are obtained by subtracting the ionization cross sections, sigma(t,ion), from the total dissociation cross sections, sigma(t,diss).

引用

页码：6969 / 6974

页数：6

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