Chemical analysis of thin films by means of SS-MS, GD-OES, and XBS demonstrated at Ir-Si thermoelectrica

被引:5
作者
Kurt, R [1 ]
Hoffmann, V [1 ]
Reiche, R [1 ]
Pitschke, W [1 ]
Wetzig, K [1 ]
机构
[1] Inst Festkorper & Werkstofforsch Dresden, D-01171 Dresden, Germany
来源
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1999年 / 363卷 / 02期
关键词
D O I
10.1007/s002160051167
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Analytical methods with low detection limits were used for the investigation of Ir-Si thin films, the physical properties of which vary strongly with the chemical composition and the amount of impurities. It is demonstrated how to solve chemical characterization of different thermoelectric Ir-Si thin films by spark source mass spectrometry (SS-MS), glow discharge optical emission spectroscopy (GD-OES) and X-ray photoelectron spectroscopy (XPS). The combined use of the three different facilities allows the quantification of impurities of elements of the entire periodic system in the ppm range (down to 30 at.-ppm in dependence on the element) incorporated in thin film samples. Additional information about the in-depth distribution of elements or specifically bonded species can be achieved with a high depth resolution.
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页码:179 / 184
页数:6
相关论文
共 13 条
[1]  
ADAMS, 1988, INORGANIC MASS SPECT
[2]   ANALYSIS OF THIN-FILMS BY SSMS - MORE DETAILED DISCHARGE MODEL AND RECENT EXPERIMENTS [J].
DERZHIEV, VI ;
RAMENDIK, GI ;
LIEBICH, V ;
MAI, H .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1980, 32 (04) :345-361
[3]  
FRANZEN J, 1966, Z NATURFORSCH PT A, VA 21, P1479
[4]  
FRANZEN J, 1967, FRESEN Z ANAL CHEM, V225, P295
[5]  
Hoffmann V, 1996, FRESEN J ANAL CHEM, V355, P826
[6]   Phase formation process of IrxSi1-x thin films structure and electrical properties [J].
Kurt, R ;
Pitschke, W ;
Heinrich, A ;
Schumann, J ;
Thomas, J ;
Wetzig, K ;
Burkov, A .
THIN SOLID FILMS, 1997, 310 (1-2) :8-18
[7]  
KURT R, 1997, I SOLID STATE MAT RE, V303
[8]  
LIEBICH V, 1974, ADV MASS SPECTROM, V6, P655
[9]  
Payling R., 1997, GLOW DISCHARGE OPTIC
[10]   COMPARISON OF DEPTH RESOLUTION FOR DIRECT-CURRENT AND RADIOFREQUENCY MODES IN GLOW-DISCHARGE OPTICAL-EMISSION SPECTROMETRY [J].
PRASSLER, F ;
HOFFMANN, V ;
SCHUMANN, J ;
WETZIG, K .
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1995, 10 (09) :677-680