Amorphous silicon waveguides and light modulators for integrated photonics realized by low-temperature plasma-enhanced chemical-vapor deposition

被引：61

作者：

Cocorullo, G ^{[1
]}

DellaCorte, FG ^{[1
]}

Rendina, I ^{[1
]}

Minarini, C ^{[1
]}

Rubino, A ^{[1
]}

Terzini, E ^{[1
]}

机构：

[1] CTR RIC PORTICI,I-80055 PORTICI,NAPLES,ITALY

来源：

OPTICS LETTERS | 1996年 / 21卷 / 24期

关键词：

D O I：

10.1364/OL.21.002002

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new amorphous silicon waveguide is realized by use of amorphous silicon carbon as cladding material. The structure is characterized both experimentally and theoretically, and its application for optical interconnections in photonic integrated circuits on silicon motherboards is proposed. The fabrication process is based on low-temperature (220 degrees C) plasma-enhanced chemical-vapor deposition and is compatible with standard microelectronic processes. Propagation losses of 1.8 dB/cm have been measured at the fiber-optic wavelength of 1.3 mu m. A strong thermo-optic coefficient has been measured in this material at this wavelength and exploited for the realization of a light-intensity modulator based on a Fabry-Perot interferometer that is tunable by temperature. (C) 1996 Optical Society of America.

引用

页码：2002 / 2004

页数：3

共 9 条

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