Microwave power handling in engineered YBa2Cu3O7-δ grain boundaries

被引:15
作者
Habib, YM [1 ]
Oates, DE
Dresselhaus, G
Dresselhaus, MS
Vale, LR
Ono, RH
机构
[1] MIT, Dept Phys, Cambridge, MA 02139 USA
[2] Natl Inst Stand & Technol, Boulder, CO 80303 USA
[3] Lincoln Lab, Lexington, MA 02420 USA
[4] USAF, Res Lab, Bedford, MA 01731 USA
关键词
D O I
10.1063/1.122422
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microwave-frequency (rf) power-dependence measurements performed on thin-film YBa2Cu3O7-delta grain boundaries engineered on sapphire bicrystal substrates with misorientation angles of theta=2 degrees, 5 degrees, 10 degrees, and 24 degrees are presented. The data are compared to measurements on films grown on single-crystal substrates. A stripline-resonator measurement technique is employed. The rf results are compared to dc measurements performed on a four-point test structure on the same substrate as the resonator. The measurements demonstrate that low-angle grain boundaries (theta less than or equal to 10 degrees) have little effect on the rf power handling, while the high-angle grain boundaries (theta=24 degrees) cause large nonlinear losses due to Josephson vortices created by rf currents. (C) 1998 American Institute of Physics. [S0003-6951(98)04541-0].
引用
收藏
页码:2200 / 2202
页数:3
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