Work function of fluorine doped tin oxide

被引：192

作者：

Helander, M. G. ^{[1
]}

Greiner, M. T. ^{[1
]}

Wang, Z. B. ^{[1
]}

Tang, W. M. ^{[1
]}

Lu, Z. H. ^{[1
,2
]}

机构：

[1] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada

[2] Yunnan Univ, Dept Phys, Kunming 650091, Yunnan, Peoples R China

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2011年 / 29卷 / 01期

基金：

加拿大自然科学与工程研究理事会;

关键词：

D O I：

10.1116/1.3525641

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Fluorine doped tin oxide (FTO) is a commonly used transparent conducting oxide in optoelectronic device applications. The work function of FTO is commonly cited as 4.4 eV, which is incommensurate with recent device performance results. Using x-ray photoelectron spectroscopy, the authors measured the work function of commercial FTO to be 5.0 +/- 0.1 eV. UV ozone treatment was found to increase the work function by similar to 0.1 eV due to surface band bending. The origins of the much lower work function previously reported are also discussed and are found to be a result of carbon contamination and UV induced work function lowering. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3525641]

引用

页数：4

共 18 条

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