Exceptional operative gate voltage induces negative bias temperature instability (NBTI) on n-type trench DMOS transistors

被引:10
作者
Aresu, S. [1 ]
Kanert, W. [1 ]
Pufall, R. [1 ]
Goroll, M. [1 ]
机构
[1] Infineon Technol AG Automat, Ind & Multimarket Div, D-85579 Neubiberg, Germany
关键词
D O I
10.1016/j.microrel.2007.07.021
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In some automotive applications, high negative bias is used to faster switch off n-type devices. This exceptional operative gate voltage at relative high temperature can induce instability of device parameters (e.g. threshold voltage, transconductance, saturation current, etc. In this work we will show that positive charge trapping generated under exceptional negative bias can induce large threshold voltage shift. Even if the effect can partially recover during the standard operative condition, nevertheless large V-th, shift are still present and can affect the correct functionality of the device. (C) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1416 / 1418
页数:3
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