Control of surface film composition and orientation with downstream PECVD of hexafluoropropylene oxide

被引：26

作者：

Butoi, CI

Mackie, NM

Barnd, JL

Fisher, ER ^{[1
]}

Gamble, LJ

Castner, DG

机构：

[1] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA

[2] Univ Washington, Dept Bioengn & Chem Engn, Seattle, WA 98195 USA

来源：

CHEMISTRY OF MATERIALS | 1999年 / 11卷 / 04期

关键词：

D O I：

10.1021/cm981081p

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Highly oriented fluorocarbon films are deposited downstream from an inductively coupled rf plasma using hexafluoropropylene oxide (HFPO). Angle-dependent XPS results [takeoff angles of 0 degrees (upper) and 80 degrees (lower)] demonstrate that the films comprise CF(2) chains terminated by CF(3) groups at the outer surface of the film. NEXAFS data establishes that the CF(2) groups are aligned in chains which are oriented normal to the substrate.

引用

页码：862 / +

页数：4

共 18 条

[1] PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SIO2 USING NOVEL ALKOXYSILANE PRECURSORS [J].