Photoluminescence at 1.9 eV in synthetic wet silica

被引:18
作者
Cannas, M [1 ]
Leone, M [1 ]
机构
[1] Univ Palermo, Dipartimento Sci Fis & Astron, Ist Nazl Fis Mat, I-90123 Palermo, Italy
关键词
D O I
10.1016/S0022-3093(00)00374-4
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report the effects of gamma -irradiation on the optical activity of wet synthetic silica samples. As a function of gamma -dose, the growth of a composite structure in the 4-6 eV spectral region of the absorption spectrum is observed. This structure can be resolved into two main contributions centered at 5.8 and 4.8 eV, respectively. The first component is usually attributed to an optical transition of the E' centers. The second one is able to excite an emission band centered at 1.9 eV. The analysis of the growth kinetics, in the gamma -dose range 20-1000 Mrad, of both emission at 1.9 eV and absorption at 4.8 eV shows that these two bands change in a similar way, reaching constant amplitudes, after an initial linear increase, at a dose depending on the OH content. In addition, their ratio is independent of the sample. These results are consistent with a structural model in which the observed optical activity arises from a single-point defect induced by gamma -irradiation. Moreover, based on the correlation with the OH content in our samples, we suggest that the principal candidate for this point defect is the non-bridging oxygen hole center(HBOHC). (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:183 / 187
页数:5
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